Feature
A heat resistant high-performance filter and our unique cooling unit are installed to enable high-temperature baking.
The chamber interior can keep class 100 (ISO: Class 5) cleanliness when the temperature is stable.
There are 2 hot-air blow types, front side blow horizontal circulation (type V) and side blow (type III). Both achieve high thermal efficiencies and good temperature uniformity.
This type of ovens is optimal for semiconductor wafer and glass substrate baking, aging and other heat treatments requiring high accuracies.
Inert gases can be introduced into the chambers to use the ovens as inert gas ovens.
Applications | Baking and curing for semiconductor wafers and glass substrate |
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